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Isotropic etching
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11	NANOELECTRONICS FABRICATION FACILITY (NFF), HKUST Standard Operating Manual UltraFab Wet Station Y Semi-Clean Organic Solvent Station Add to Reading List Source URL: mfz140.ust.hk Language: English - Date: 2014-09-24 23:25:16 Etching Resist Wafer Isotropic etching Semiconductor device fabrication Materials science Technology
12	PDF Document Add to Reading List Source URL: artslinkqld.com.au Language: English - Date: 2013-11-19 18:09:31 Communication design Etching Intaglio Aquatint Drypoint Edition Isotropic etching Printmaking Visual arts Graphic design
13	A FULLY DRY SELF-ASSEMBLY PROCESS WITH PROPER IN-PLANE ORIENTATION Sangjun Park and Karl F. Bö Böhringer Department of Electrical Engineering University of Washington, Seattle, WA[removed] Add to Reading List Source URL: www.ee.washington.edu Language: English - Date: 2008-01-10 14:48:22 Technology Deep reactive-ion etching Etching Microfabrication Wafer Isotropic etching Passivation Microelectromechanical systems Semiconductor device fabrication Materials science Microtechnology
14	AMONIL® & AMOPRIME - low viscosity imprint resist and adhesion promoter Description: UV Nanoimprint is a mechanical molding technique. A template made from quartz or a ﬂexible elastomer with a 3D relief is brought int Add to Reading List Source URL: amo.de Language: English - Date: 2014-09-25 05:43:12 Technology Spin coating Resist Ultraviolet Isotropic etching Semiconductor device fabrication Nanoimprint lithography Materials science
15	A FULLY DRY SELF-ASSEMBLY PROCESS WITH PROPER IN-PLANE ORIENTATION Sangjun Park and Karl F. Böhringer Department of Electrical Engineering, University of Washington, Seattle, Washington, USA ABSTRACT A fully dry self-as Add to Reading List Source URL: www.ee.washington.edu Language: English - Date: 2007-10-22 10:46:49 Technology Etching Deep reactive-ion etching Microfabrication Integrated circuit Three-dimensional integrated circuit Wafer Isotropic etching Microelectromechanical systems Semiconductor device fabrication Materials science Microtechnology
16	ENVIRONMENTAL COMPLIANCE AND POLLUTION PREVENTION GUIDE for the Electronics and Computer Industry October 1999 Add to Reading List Source URL: www.epa.gov Language: English - Date: 2007-11-02 15:53:14 Microtechnology Isotropic etching Etching Wafer Photolithography Integrated circuit Epitaxy Resist Doping Semiconductor device fabrication Materials science Technology
17	News Release Nanoplas Announces Important New 14nm Order and Joint Development Agreement with CEA-Leti High-selectivity dry-etch for 14nm OEM pilot line will replace wet etch; CEA-Leti to qualify the system for addition Add to Reading List Source URL: www-leti.cea.fr Language: English - Date: 2013-11-27 09:43:38 Technology Etching Plasma processing Microelectromechanical systems Transducers Dry etching Isotropic etching Plasma etching Wafer Semiconductor device fabrication Microtechnology Materials science
18	News Release Nanoplas Announces Important New 14nm Order and Joint Development Agreement with CEA-Leti High-selectivity dry-etch for 14nm OEM pilot line will replace wet etch; CEA-Leti to qualify the system for addition Add to Reading List Source URL: www-leti.cea.fr Language: English - Date: 2013-11-27 09:43:38 Technology Etching Plasma processing Microelectromechanical systems Transducers Dry etching Isotropic etching Plasma etching Wafer Semiconductor device fabrication Microtechnology Materials science
19	Computer Chips new:Environment[removed] Add to Reading List Source URL: www.plasmacoalition.org Language: English - Date: 2006-08-29 00:35:20 Microtechnology Plasma processing Etching Plasma Microfabrication Wafer Isotropic etching Thin film Integrated circuit Semiconductor device fabrication Materials science Technology
20	Contents I. Promontory Hills    Add to Reading List Source URL: www.ohioswallow.com Language: English - Date: 2011-06-15 10:06:54 Data management Library science Monopoly Rembrandt Isotropic etching Intellectual property law Information Copyright

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